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Home / Laboratory Machine / PVD Coater / Magnetron Sputtering Coater /High Vacuum RF+DC Magnetron Ion Sputtering Coater Coating Machine

High Vacuum RF+DC Magnetron Ion Sputtering Coater Coating Machine

Wechat:17720812054

Whatsapp:+86 17720812054

Email:David@batterymaking.com

  • Item NO.:

    TMAX-BY-JS12
  • Payment:

    L/C D/A D/P T/T Western Union
  • Shipping Port:

    Xiamen Port
  • Lead Time:

    5 days
  • Certificate:

    CE Certified
  • Product Detail

High Vacuum RF+DC  Magnetron Ion Sputtering Coater Coating Machine


Model: TMAX-BY-JS12| – Product Specifications


Technical Specifications

Parameter

Specification

Vacuum Pump System

Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set

Rotary Pump Speed

50Hz: 16m³/h (4.4 L/s) | 60Hz: 19.2m³/h (5.2 L/s)

Molecular Pump Speed

300 L/s

Ultimate Vacuum

5 × 10⁻⁴ Pa

Working Pressure

0.5 – 5 Pa

Pump-Down Time

>10 min (to 10 Pa)

Vacuum Measurement

Range: Atmosphere to 10⁻⁴ Pa

Gas Control

Mass Flow Controller (MFC)

Chamber Size

φ260mm × 200mm (Metal Chamber)

Magnetron Target Source

Target Size: φ50mm × 3mm (Copper) 

Compatible with Weakly Magnetic Materials

Operation Method

Manual Control (Instruction Manual Provided)

Weight / Dimensions

100kg / 610mm (L) × 420mm (W) × 490mm (H)

Power Supply

AC 110V 60Hz or AC 220V 50Hz

Power Consumption

<3000W

Cooling System

Air Cooling (Pump) + Water Cooling (Sputtering Target)

Warranty

1-Year Limited Warranty with Lifetime Technical Support


Key Features & Applications

Core Advantages

1. Multi-Mode Sputtering

Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings.

2. High Vacuum Stability

Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films.

3. Flexible Compatibility

·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples.

·φ50mm target supports copper and weakly magnetic materials for diverse applications.

4. Efficient Cooling System

·Water-cooled target minimizes thermal load during high-power sputtering.

· Air-cooled pump reduces maintenance costs for continuous operation.

Typical Applications

·Research Fields
Thin film deposition, nanostructured coatings, semiconductor device development.

·Industrial Uses
Optical coatings, wear-resistant layers, surface modification of electronic components.


RF Sputter Coater

RF Sputter Coater

   

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