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Home / Laboratory Machine / PVD Coater / Magnetron Sputtering Coater /Nano Dual-Target Magnetron Sputtering Coating System For Multilayer Films Deposition

Nano Dual-Target Magnetron Sputtering Coating System For Multilayer Films Deposition

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Whatsapp:+86 17720812054

Email:David@batterymaking.com

  • Item NO.:

    TMAX-PC-JS08
  • Payment:

    L/C D/A D/P T/T Western Union
  • Shipping Port:

    Xiamen Port
  • Lead Time:

    5 days
  • Certificate:

    CE Certified
  • Product Detail

Nano Dual-Target Magnetron Sputtering Coating System For Multilayer Films Deposition



Model: TMAX-PC-JS08-Dual-Target, Multilayer Films Deposition


Equipment Purpose

Designed for nano-scale single/multilayer functional films (hard coatings, metals, semiconductors, dielectrics). Features pre-sputtering cleaning for enhanced adhesion.


System Components

· Vacuum chamber, dual magnetron targets, heating stage, DC/RF power supplies, gas delivery, vacuum pumps, control system.


Technical Parameters

Category

Specification

Chamber Structure

Vertical front-loading; stainless steel/vacuum materials

Base Pressure

≤5×10−5 Pa

Leak Rate

≤5×10−7 Pa·L/s

Pressure Rise Rate

≤10 Pa (after 12 hours, pump off)

Pumping System

Domestic molecular pump + mechanical pump

Targets

2× 4-inch HV (1 standard-field, 1 strong-field); DC/RF compatible (Kurt J. Lesker)

Target-Sample Distance

40–120 mm (multilayer); 80–120 mm (with ion source)

Power Supplies

RF: 1000 W, 13.56 MHz (auto-matching); DC: 1000 W (AE brand)

Sample Stage

3 substrates; 5–30 RPM rotation; 450°C heating; 1000 V bias

Film Thickness

Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm (±5% uniformity over 2-inch area)

Adhesion Test

Passes 3-tape peel (glass/Si/ceramic)

Gas System

2 MKS mass flow controllers (Ar + reactive gas); mixing capability

Baking Temperature

150°C (infrared heating)


Key Features

1. Dual-Target Flexibility

o Enables co-sputtering or sequential deposition for complex multilayers.

2. High Adhesion & Cleanliness

o Integrated pre-sputtering cleaning and ion-assisted deposition (anode-layer source).

3. Precision Process Control

o Programmable temperature (450°C max), rotation (5–30 RPM), and gas flow.

4. Safety & Reliability

o Interlocks for power/water failures; manual controls for critical operations.


Target Applications

· Research: Nanomaterials, thin-film physics, prototype development.

· Education: Advanced deposition techniques training.

· Industry: Small-batch functional coatings (e.g., optics, electronics).

Magnetron Sputtering Coater

   

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