Small Triple-Target Ion Sputtering Coater System

Three-Targets Small Magnetron Sputtering Coating System

TMAX-BY-JS11-Triple-Target Ion Sputtering Coater – Product Specifications

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Key Features

• Triple-target design for multi-material deposition in a single run
• DC sputtering technology ensures reliable, high-quality thin-film coating
• Versatile applications for SEM sample preparation, conductive layer coating, and protective film deposition
• Adjustable parameters (gas, current, vacuum) for optimized film properties

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Technical Specifications

Parameter	Details
Target Materials	Standard: Au (50mm × 0.1mm)   Optional: Ag, Al, Pt, and more
Target Size	47mm diameter
Control Mode	Manual operation
Chamber Dimensions	Ø160mm × 120mm (H)
Sample Stage	Adjustable (Ø50mm/70mm standard, customizable)
Sputtering Gas	Ar, N₂, and others (selectable for different applications)
Sputtering Current	Max 50mA (recommended ≤30mA)
Deposition Rate	>40nm/min
Vacuum System	High-performance vacuum pump included

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Why Choose this?

✔ Multi-material coating – Deposit three different materials without breaking vacuum
✔ Enhanced SEM imaging – Reduces charging effects on non-conductive samples
✔ Precision control – Adjustable gas flow, current, and vacuum for optimal film uniformity
✔ Wide compatibility – Supports biological, polymer, and advanced material samples

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Applications

• Electron-beam-sensitive samples (e.g., biological, polymers): Protective coating prevents beam damage
• Non-conductive samples: Eliminates charging effects for crisp SEM imaging
• Advanced materials research: Electrode fabrication and thin-film studies

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Standard Package Includes

• Main unit with triple-target configuration
• Gold target (50mm × 0.1mm)
• High-performance vacuum pump
• Adjustable sample stage (50mm/70mm)

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Optional Accessories

• Additional target materials (Ag, Al, Pt, etc.)
• Custom sample stage sizes

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Optimized for Performance · Designed for Researchers

(For detailed inquiries, contact our technical team for tailored solutions.)