High-Vacuum Multi-Material Evaporation Deposition Coating System Machine For OLED, Solar Cell & Semiconductor

Category

Parameter

Specification

Basic Configuration

Model

TMAX-TK-ZD02

Coating Method

Multi-source evaporation deposition

Chamber Structure

Vertical square, front-opening design

Vacuum System

Chamber Dimensions

Ø400mm × H500mm (Material: 304 stainless steel)

Ultimate Vacuum

≤6.0×10⁻⁴ Pa

Pump-down Time

≤45 min (Atmosphere→10⁻⁴ Pa)

Pump Configuration

Compound molecular pump (FF-200/1200, 1200L/s) + Rotary vane pump (TRP-36, 9L/s)

Vacuum Valves

GDQ-200 main valve + GDQ-40 bypass valve

Deposition Control

Heating Temperature

Room temperature ~ 300°C

Substrate Holder

120mm×120mm (Custom sizes available)

Film Uniformity

≤±5.0%

Evaporation Sources

3 groups (Boat-type + Filament-type for metals) with baffles

Thickness Control

Quartz crystal monitor (Optional, 1 water-cooled probe) 

Operational

Control System

PLC + Touchscreen

Safety Protection

Water shortage/Overcurrent/Voltage fault alarms

Power Requirement

≥8kW

Dimensions

1710mm(L)×850mm(W)×1850mm(H)

Parameter

TK-ZD02

Entry-Lab Systems

Industrial Systems

Evaporation Sources

3 independent (metal/organic hybrid)

1-2 single-type sources

4-6 (customized)

Thickness Control

±5.0% (upgradable to ±2.0%)

±8-10% (no real-time monitoring)

±1-3% (multi-probe standard)

Heating Rate

10°C/min (RT→300°C)

≤5°C/min

15-20°C/min (high-temp)

Leak Rate

≤5×10⁻⁹ Pa·m³/s (metal seals)

≤1×10⁻⁷ Pa·m³/s (rubber seals)

≤1×10⁻¹⁰ Pa·m³/s

Maintenance Cycle

500hrs (turbo pump)

300hrs

1000hrs (mag-lev pumps)

Coating Area

144cm² (expandable to 400cm²)

50-100cm²

1000cm²+