Small PVD Thin Film Deposition Coating Machine System For Metals And Organics

Feature

This System

Typical Competing Systems

Vacuum Speed

15–20 min to high vacuum (≤5×10⁻⁵ Pa)

Often 30+ min for similar vacuum levels.

Film Uniformity

±3%–5% thickness deviation

Typically ±5%–10% in entry-level models.

Chamber Material

304 stainless steel (high corrosion resistance)

Some use aluminum or lower-grade steel.

Modularity

Supports 1–3 evaporation sources (expandable)

Fixed configurations common in low-end systems.

Footprint

Compact (500×360×420mm for desktop model)

Larger benchtop units often >600×500mm.

Parameter

Specification

Vacuum Chamber

304 stainless steel, cylindrical (Φ260×H350 mm)

Internal Coating Area

~Φ260×H310 mm

Ultimate Vacuum

≤5×10⁻⁵ Pa

Pumping Speed

≤8×10⁻⁴ Pa in 30 min, holds ≤5 Pa for 12 hours

Substrate Stage

- Max size: 80×80 mm (standard) / 120 mm diameter (rotary)

 - Rotation: 0–20 RPM (magnetic fluid sealed)

Film Uniformity

<5% (120 mm diameter area)

Evaporation Sources

2–3 sources (metal/organic compatible, co-evaporation or switching)

Power Supply

2 kW, constant current/power modes

Electrical

AC 220 V / 50 Hz, 3.5 kW

Dimensions (L×W×H)

- Main unit: 600×500×900 mm

 - Desktop model: 500×360×420 mm