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Home / Laboratory Machine / PVD Coater / Magnetron Sputtering Coater /Laboratory Auto Magnetron Sputtering Metal Coater For Metal, Oxide, and Semiconductor Thin Films

Laboratory Auto Magnetron Sputtering Metal Coater For Metal, Oxide, and Semiconductor Thin Films

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Whatsapp:+86 17720812054

Email:David@batterymaking.com

  • Item NO.:

    TMAX-PD-JS04
  • Payment:

    L/C D/A D/P T/T Western Union
  • Shipping Port:

    Xiamen Port
  • Lead Time:

    5 days
  • Certificate:

    CE Certified
  • Product Detail

Laboratory Auto Magnetron Sputtering Coater For Metal, Oxide, and Semiconductor Thin Films in SEM, Energy Materials



Model:  TMAX-PD-JS04-Adjustable Multi-Target System for Metal, Oxide, and Semiconductor


Product Overview

The TMAX-PD-JS04 is a compact magnetron sputtering system designed for laboratory applications, including the deposition of metallic, oxide, dielectric, and semiconductor thin films, as well as the preparation of electrode materials for SEM sample coating. It is also suitable for educational purposes and pre-production process testing. With user-friendly operation, multifunctional capabilities, and high scalability, this system is ideal for academic research and industrial R&D.

Key Features

✔ Adjustable Co-Focal Sputtering Structure: The target gun height and angle are adjustable for optimized deposition.
✔ Stable Gas Distribution: Process gases are introduced near the target surface, ensuring uniform reaction gas concentration throughout the vacuum chamber.
✔ Flexible Control Options: Supports both manual operation (Siemens PLC + touchscreen) and fully automatic control (computer + PLC).
✔ Precise Heating & Bias Control: The substrate stage supports heating up to 500°C (accuracy: ±3°C at 200°C, ±1.5°C at 500°C) and bias voltage up to -800V.
✔ High Uniformity: Film uniformity within ±3%~±5% over a 3-inch area.

Technical Specifications

Parameter

Value

Chamber Dimensions (L×W×H mm)

300 × 300 × 380

System Dimensions (L×W×H mm)

600 × 900 × 1900

Base Pressure

≤5×10⁻⁵ Pa

Pumping & Holding Capability

≤8×10⁻⁴ Pa (30 min) / ≤8 Pa (12 hrs)

Target Guns

2 guns (2-inch or 3-inch optional)

Sputtering Coverage

2–4 inches

Advantages & Applications

✔ Advantages

· Co-focal sputtering design for precise film control.

· High uniformity (±3%~±5%) ensures consistent coating quality.

· Multi-functional for diverse thin-film research needs.

✔ Applications

· Academic Research: Thin-film studies, electrode fabrication, and SEM sample preparation.

· Advanced Materials: R&D in energy-related organic materials and novel processes.

This system excels in low-temperature, high-precision, and controllable thin-film deposition, making it a versatile tool for scientific and industrial innovation.

   

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