Manual Magnetron Sputtering Metal Coater Equipment For Thin Film Fabrication

Manual Compact Magnetron Ion Sputtering Coater For Thin Film Fabrication

Model:  TMAX-ZK-JS05- Compact Ion Sputtering Coater

Overview

The TMAX-ZK-JS05 Compact Ion Sputtering Coater is designed for depositing conductive gold films on samples for scanning electron microscopy (SEM). With user-friendly operation, it is an essential tool for sample preparation in small to medium-sized SEM laboratories.

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Key Applications

· Gold ion sputtering for SEM sample coating.

· Compatible with target materials: Au, Pt, Cr, Ag, Ti, Cu, Ni, Au-Pd alloy, etc.

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Technical Specifications

Category	Specification
Chamber Material	Glass
Chamber Dimensions	Ø100 mm (diameter) × 130 mm (height)
Sample Stage (Small)	Ø40 mm (holds 6 sample cups simultaneously)
Sample Stage (Large, Optional)	Ø60 mm
Gold Target Size	Ø58 mm
Vacuum Pump	Two-stage direct-drive rotary vane pump (1 L/s)
Vacuum Measurement	Pirani gauge
Vacuum Protection	20 Pa with fine-adjustment gas inlet valve
Working Gases	Air / Argon (dedicated inlet with flow control)

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Features & Advantages

· Robust Design – Special sealing structure minimizes glass chamber damage.
· High Compatibility – Supports Au, Pt, Cr, Ag, Ti, Cu, Ni, and Au-Pd alloy targets.
· Precision Control – Adjustable gas flow and vacuum protection ensure uniform coatings.
· Efficient Workflow – Dual-stage platform allows batch processing (6 samples at once).

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Recommended Applications

✔ SEM Sample Prep – Ideal for non-conductive specimen coating.
✔ Materials Research – Thin-film deposition for nanotechnology studies.
✔ Industrial QC – Reliable performance for repeatable conductive layering.